Facilities

This facility is the first of its kind in India, being a third party independent treatment plant. It is planned with multiphase approach. Phase I is spread across 20,000 sq. ft. with an option for future expansions. The facility is fully functional with all the equipment commissioning trails been completed in January 2009. The facility is fully equipped with power support given by 2 MW transformer & 2.2 MW generator backup.


Existing Processes

Following are the fully  functional processes that are currently undertaken:
 
  • Fully automated Chromic acid anodizing

  • Semi automated Boric sulphuric acid anodizing

  • Titanium etching

  • Chemical conversion coating

  • Vacuum blasting & glass bead cleaning

  • 6 axis robot operated Shot peening

  • Painting booth & ovens

  • PFD booth

  • MPI machine

  • Al etching

  • Passivation

  • Alodine

  • PFD with aluminum etching

  • Part marking by electrochemical etching & inkjet marking
     


Following are the fully functional testing processes:
 
  • PH meter

  • Weighing balance

  • MPI machine

  • Chemical lab

  • Hardness testing

  • Salt Spraying
     

 
 
Chromic anodizing Boric sulphuric anodizing Titanium etching Alchrome
       
Shot Blasting Shot Peening Painting booth & ovens PFD booth
       
     
Salt spraying      

 
PH meter Weighing balance MPI Machine Chemical lab
       
     
Hardness testing      
 
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